Tescan Solaris X (Solaris X)
Site:
Karlsruhe
Tescan Solaris X DualBeam FIB equipped with Omniprobe micromanipulator and option for 3D Slice&View and TEM sample preparation.
The Tescan Solaris X, is a combination of a scanning electron microscope (SEM) and a focused ion beam (FIB) system, which allows imaging and structuring of materials at the nanoscale.
Configuration
- Operation Voltage:
- High Tension SEM: 200 V - 30 kV
- High Tension FIB: 3 kV - 30 kV
- Source
- FEG (Schottky)
- Xenon Plasma Source
- Imaging Detectors:
- InBeam SE, (energy filtered) BSE, mid-angle BSE
- Retractable LBSE detector
- Retractable STEM detector
- Gas Injection System (GIS)
- Multi-GIS (W, Pt, XeF2, C)
- Manipulators
- Omniprobe 400 with independent x,y, z motion and rotation
Resolution
30 kV
Electron Beam [nm]: 0.5
Gallium Ion Beam [nm]: 12
15 kV
Electron Beam [nm]: 0.6
1 kV
Electron Beam [nm]: 1.2
Imaging, Analysis and Sample Preparation Techniques
- SE & BSE SEM analysis
- STEM imaging
- 3D Slice & View tomography
- TEM sample preparation
- Nanoscale deposition and contacting
Access
Operated as part of the Karlsruhe Nano Micro Facility. Proposal based access; see:
Link: https://www.knmf.kit.edu/
Link: https://www.knmf.kit.edu/
Weblinks