Detectors:• SE Everhart-Thornley detector (ET-SED)• In-lens detectors: Lower (T1) and Upper (T2)• X-Max 150 EDS silicon drift detector for elemental analysis, energy resolution 127 eV @ MnKα (Oxford)• IR-CCD camera to …
The FEI Helios NanoLab 400S FIB-SEM is one of the world’s most advanced DualBeamTM focused ion beam (FIB) platforms for transmission electron microscopy (TEM) sample preparation, scanning electron microscopy (SEM) imaging and analysis in semiconductor …
The FEI Helios NanoLab 460F1 is a highly advanced dual beam FIB-SEM platform for imaging and analytical measurements, transmission electron microscopy (TEM) sample and atom probe (AP) needle preparation, process development and process control. For …
FEI Strata 400 DualBeam FIB equipped with an Omniprobe micromanipulator, Oxford EDX system and GIS (Pt, W, C, SiO2).
A combination of Plasma FIB and field-free UHR FE-SEM for multiscale materials characterization
Tescan on Amber X
Tescan Solaris X DualBeam FIB equipped with Omniprobe micromanipulator and option for 3D Slice&View and TEM sample preparation.The Tescan Solaris X, is a combination of a scanning electron microscope (SEM) and a focused ion …
The Zeiss Auriga 60 Dual Beam FIB is a combination of a scanning electron microscope (SEM) and a focused ion beam (FIB) system, which allows imaging and structuring of materials at the nanoscale. It is …
